Advances in Deep Foundations
by Kikuchi, Yoshiaki Kimura, Makoto Morikawa, Yoshiyuki Otani, Jun
Civil Engineering has recently seen enormous progress in the core field of the construction of deep foundations. This book is the result of the International Workshop on Recent Advances in Deep Foundations (IWDPF07), which was held in Yokosuka, Japan from the 1st to the 2nd of February, 2007. The topics under discussion in this book include: recent research achievements and case histories; and current advances in the applied aspects of deep foundations, such as reliability-based design, field t…
Read More ↓Title Statements
- Full title :Advances in Deep Foundations.
Summary
Civil Engineering has recently seen enormous progress in the core field of the construction of deep foundations. This book is the result of the International Workshop on Recent Advances in Deep Foundations (IWDPF07), which was held in Yokosuka, Japan from the 1st to the 2nd of February, 2007. The topics under discussion in this book include: recent research achievements and case histories; and current advances in the applied aspects of deep foundations, such as reliability-based design, field tests and experimental field work. The book also features the latest numerical simulation methods and theoretical findings. There are nine keynote lectures, focusing on foundation engineering in different parts of the world, and thirty-three state-of-the-art papers from eminent international experts. The techniques covered include sheet piles, piles, pile-ground improvement and ground improvement, while dynamic aspects and design are also discussed. This book is intended for an international audience of researchers and professionals in soil and foundation engineering.
Read More ↓Edition Statements
- Publication Date:2007.
Publication Statements
- Publisher(s):Taylor & Francis
- Language:eng
- Publication Date:2007.
The Physical Object
- Description:1 online resource
Edition Identifiers
- ISBN:1280955112, 9781280955112, 9780415436298, 041543629X
- oclc:ocn814504229
- LC Classification:TA780
- Dewey Decimal:624.15
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