High density plasma sources: design, physics and performance
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma process…
Read More ↓Title Statements
- Full title :High density plasma sources : design, physics and performance / ed. by Oleg A. Popov.
Summary
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing.
Read More ↓Edition Statements
- Publication Date:1995.
Publication Statements
- Publisher(s):Noyes
- Place of Publication:Park Ridge, NJ
- Language:eng
- Publication Date:1995.
The Physical Object
- Description:XX, 445 Seiten : : Diagramme
Edition Identifiers
- ISBN:0815513771, 9780815513773, 9780815517894, 0815517890, 9781591240631, 1591240638
- oclc:ocn873458137
- LC Classification:QC718.5.D4
- Dewey Decimal:530.442
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