High-k materials in multi-gate FET devices

High-k materials in multi-gate FET devices

by Tayal, Shubham

Type Book
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"This book focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. This work will be of high interest to researchers in materials science, electronics engineering, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues"--

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Title Statements

  • Full title :High-k materials in multi-gate FET devices / edited by Shubham Tayal, Parveen Singla, and J. Paulo Davim.

Summary

"This book focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. This work will be of high interest to researchers in materials science, electronics engineering, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues"--

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Edition Statements

  • Publication Date:©2022
  • Edition:First edition

Publication Statements

  • Publisher(s):CRC Press
  • Place of Publication:Boca Raton, FL
  • Language:eng
  • Publication Date:©2022

The Physical Object

  • Description:1 online resource (xii, 164 pages) : : illustrations.

Edition Identifiers

  • ISBN:9781003121589, 1003121586, 9781000438789, 1000438783, 9781000438819, 1000438813
  • DOI:10.1201/9781003121589
  • oclc:on1262641114
  • LC Classification:QD551
  • Dewey Decimal:537/.24

Table of Contents

Introduction to multi-gate FET devices / T. S. Arulananth, S. V. S. Prasad, and K. Srinivas Rao -- High-k gate dielectrics and metal gate stack technology for advance semiconductor devices : an overview / Vibhu Goyal, Shubham Tayal, Shweta Meena, Ravi Gupta, and Sandip Bhattacharya -- Influence of high-k material in gate engineering and in multi-gate field effect transistor devices / C. Usha and P. Vimala -- Trap charges in high-k and stacked dielectric / Annada Shankar Lenka and Prasanna Kumar Sahu -- Impact of high-k dielectric on the gate-induced drain leakage of multi-gate FETs / Varshini K. Amirtha and Shubham Sahay -- Advanced FET design using high-k gate dielectric and characterization for low-power VLSI / P. Vimala and T. S. Arun Samuel -- Simulation and analysis of gate stack DG MOSFET with application of high-k dielectric using visual TCAD / Nisha Yadav, Sunil Jadav, and Gaurav Saini -- Novel architecture in gate all-around (GAA) MOSFET with high-k dielectric for biomolecule detection / Krutideepa Bhol, Biswajit Jena, Umakanta Nanda, Shubham Tayal, and Amit Kumar Jain -- Asymmetric junctionless transistor : a SRAM performance study / Gaurav Saini and Trailokya Nath Sasam…

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