Plasma etching processes for CMOS device realization

Plasma etching processes for CMOS device realization

by Posseme, Nicolas

Type Book
Rate 0.0 /5
Details
Files
Reviews
Download

Title Statements

  • Full title :Plasma etching processes for CMOS device realization / Nicolas Posseme [aut]

Edition Statements

  • Publication Date:2017

Publication Statements

  • Publisher(s):ISTE Press :Elsevier
  • Place of Publication:London, UK :Kidlington, Oxford, UK
  • Language:eng
  • Publication Date:2017

The Physical Object

  • Description:1 online resource

Edition Identifiers

  • ISBN:9780081011966, 0081011962
  • oclc:on1281884629

Writers

Posseme, Nicolas

Rate & Review

0.0/5
(0 people Voted)

No reviews yet. Be the first to rate this work.

Files & Downloads

  • Plasma Etching Processes for CMOS Devices Realiza…

    PDF · 17.5 MB · updated
    Login →
Log in to request a copy