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Rates of chemical-mechanical planarization (CMP) are dependent largely on tribology in the process of wear on nanosurfaces. To address the needs of researchers needing more information in either or both CMP and tribology, the authors first present the basic processes associated,…
"As the first source to integrate CMP and tribology, the book illustrates the important role that these fields play in manufacturing and technological development. It follows with an examination of tribological principles and their applications in CMP, including integrated circu…