Developments in surface contamination and cleaning

Developments in surface contamination and cleaning

by Kohli, Rajiv Mittal, K. L.

Type Book
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In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or dealing with the consequences of surface contamination. This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-parti…

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Title Statements

  • Full title :Developments in surface contamination and cleaning. / edited by Rajiv Kohli and K.L. Mittal.

Summary

In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or dealing with the consequences of surface contamination. This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-particulate contaminants, such as metallic and non-metallic thin films, hydrocarbons, toxic and.

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Edition Statements

  • Publication Date:2013.

Publication Statements

  • Publisher(s):Elsevier
  • Place of Publication:Amsterdam
  • Language:eng
  • Publication Date:2013.

The Physical Object

  • Description:1 online resource

Edition Identifiers

  • ISBN:9781437778823, 1437778828
  • oclc:ocn913617659
  • LC Classification:TA418.7
  • Dewey Decimal:620/.44

Table of Contents

Front Cover; Developments in Surface Contamination and Cleaning: Contaminant Removal and Monitoring; Copyright; Contents; Preface; About the Editors; Contributors; Chapter 1 -- Surface Contamination Removal Using Dense-Phase Fluids: Liquid and Supercritical Carbon Dioxide; 1. INTRODUCTION; 2. SURFACE CLEANLINESS LEVELS; 4. PRINCIPLES OF DENSE-PHASE CO2 CLEANING; 5. ADVANTAGES AND DISADVANTAGES OF DENSE-PHASE CO2 CLEANING; 6. APPLICATIONS; 7. SUMMARY AND CONCLUSIONS; ACKNOWLEDGMENT; DISCLAIMER; REFERENCES.

Chapter 2 -- Plasma Cleaning for Electronic, Photonic, Biological, and Archeological Applications1. INTRODUCTION; 2. PLASMA REACTOR CONFIGURATIONS; 3. SEMICONDUCTOR MANUFACTURING; 4. PHOTOVOLTAIC CELL PROCESSING; 5. PLASMA STERILIZATION; 6. PLASMA CLEANING IN THE RESTORATION INDUSTRY; 7. PLASMA CLEANING APPLICATIONS IN ELECTRON MICROSCOPY; 8. ADDITIONAL PLASMA APPLICATIONS; 9. SUMMARY AND FUTURE NEEDS; REFERENCES; Chapter 3 -- Clean Room Wipers for Removal of Surface Contamination; 1. PRINCIPLES OF WIPING FOR REMOVAL OF CONTAMINANTS; 2. TYPES OF WIPERS; 3. WIPER TESTING.

4. METHODS TO ASSESS WIPER QUALITY5. THE IMPORTANCE OF AUTOMATION; 6. APPLICATIONS; 7. CURRENT TRENDS IN WIP…

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Subjects

Particles -- Measurement Surface contamination -- Prevention Surfaces (Technologie) -- Inspection Surfaces (Technology) -- Inspection

Writers

Kohli, Rajiv Mittal, K. L.

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