Developments in Surface Contamination and Cleaning

Developments in Surface Contamination and Cleaning: Volume 10

by Kohli, Rajiv

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Title Statements

  • Full title :Developments in Surface Contamination and Cleaning : Volume 10.

Edition Statements

  • Publication Date:©2017.

Publication Statements

  • Publisher(s):William Andrew
  • Place of Publication:Norwich
  • Language:eng
  • Publication Date:©2017.

The Physical Object

  • Description:1 online resource (214 pages)

Edition Identifiers

  • ISBN:9780323431729, 0323431720
  • oclc:on1059047037
  • LC Classification:TA418.7D484 2017
  • Dewey Decimal:620.44

Table of Contents

Front Cover -- Developments in Surface Contamination and Cleaning -- Copyright Page -- Contents -- List of Contributors -- About the Editors -- Preface -- 1 Nonaqueous Cleaning Challenges for Preventing Damage to Fragile Nanostructures -- 1 Introduction -- 2 Water-Caused Problems in Device Fabrication -- 2.1 High Resistivity of Water -- 2.2 High Reactivity of Water with Silicon -- 2.3 High Permittivity of Water -- 2.4 Dissolution and Corrosion of Metals in Water -- 2.5 High Surface Tension of Water -- 3 HF Vapor Processing -- 4 Cryogenic Aerosol Nitrogen Cleaning -- 5 Supercritical Fluid Cleaning -- 5.1 Wafer Drying with SCCO2 -- 5.2 Wafer Cleaning with SCCO2 -- 6 Pinpoint Cleaning -- 6.1 Laser Cleaning -- 6.2 Atomic Force Microscopy Nanoprobe Sweeping -- 6.3 Nanotweezers Pickup -- 7 Summary -- References -- 2 Gas-Phase Cleaning for Removal of Surface Contaminants -- 1 Introduction -- 2 Surface Contamination and Cleanliness Levels -- 3 General Principles of Gas-Phase Cleaning -- 4 Process Variables in Gas-Phase Cleaning -- 4.1 Types of Gases -- 4.2 Cleaning Process Parameters -- 4.3 Gas Sources and Their Availability -- 4.4 Types of Contaminants -- 4.5 Types of Substrates -- 5 Cle…

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Subjects

Surfaces (Technology) -- Inspection

Writers

Kohli, Rajiv Mittal, Kashmiri L.

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