High density plasma sources

High density plasma sources: design, physics, and performance

by Popov, Oleg A.

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This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma process…

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Title Statements

  • Full title :High density plasma sources : design, physics, and performance / edited by Oleg A. Popov.

Summary

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and pr.

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Edition Statements

  • Publication Date:c1995.

Publication Statements

  • Publisher(s):Noyes Publications
  • Place of Publication:Park Ridge, N.J
  • Language:eng
  • Publication Date:c1995.

Notes

Description based upon print version of record.

The Physical Object

  • Description:1 online resource (467 p.).

Edition Identifiers

  • ISBN:1282755080, 9781282755086, 9786612755088, 6612755083, 1282253212, 9781282253216, 9786612253218, 6612253215, 0815517890, 9780815517894, 1591240638, 9781591240631
  • oclc:on1136254957
  • LC Classification:QC718.5.D4
  • Dewey Decimal:530.44

Table of Contents

Front Cover; High Density Plasma Sources: Design, Physics and Performance; Copyright Page; Contents; Chapter 1 Helicon Plasma Sources; 1.0 INTRODUCTION; 2.0 SUMMARY OF THEORY; 3.0 EXPERIMENTAL TESTS OF THEORY; 4.0 DESIGN OF HELICON SOURCES; 5.0 HELICON REACTORS FOR ETCHING AND DEPOSITION; ACKNOWLEDGMENTS; REFERENCES; Chapter 2 Planar Inductive Sources; 1.0 INTRODUCTION; 2.0 OPERATION; 3.0 POWER COUPLING; 4.0 FACTORS AFFECTING PROCESSING OF SUBSTRATES; 5.0 ETCHING APPLICATIONS OF PLANAR INDUCTIVELY COUPLED PLASMA SOURCES; REFERENCES

Chapter 3 Electrostatically-Shielded Inductively-Coupled RF Plasma Sources1.0 INTRODUCTION; 2.0 SURVEY OF HIGH DENSITY PLASMA SOURCES; 3.0 ANATOMY OF AN INDUCTIVELY COUPLED PLASMA; 4.0 UNSHIELDED HELICAL PLASMA SOURCES; 5.0 ELECTROSTATIC SHIELDING; 6.0 ESRF PLASMA SOURCE APPLICATIONS; 7.0 CONCLUSIONS; REFERENCES; Chapter 4 Very High Frequency Capacitive Plasma Sources; 1.0 INTRODUCTION; 2.0 STRUCTURE OF HIGH FREQUENCY CAPACITIVE PLASMAS; 3.0 ENERGY TRANSFER; 4.0 VHF PLASMA PARAMETERS; 5.0 VHF PROCESSING RESULTS; 6.0 SUMMARY; ACKNOWLEDGMENTS; REFERENCES; Chapter 5 Surface Wave Plasma Sources

1.0 INTRODUCTION2.0 SUMMARY OF THE MAIN PROPERTIES OF SW SUST…

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Subjects

High temperature plasmas Plasma density Plasma generators

Writers

Popov, Oleg A.

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