Plasma etching processes for interconnect realization in VLSI
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This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions.
Read More ↓Title Statements
- Full title :Plasma etching processes for interconnect realization in VLSI / Nicolas Posseme [aut]
Summary
This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions.
Read More ↓Edition Statements
- Publication Date:2015
Publication Statements
- Publisher(s):ISTE Press ;Elsevier Ltd
- Place of Publication:London :Oxford
- Language:eng
- Publication Date:2015
The Physical Object
- Description:1 online resource
Edition Identifiers
- ISBN:9780081005903, 0081005903
- oclc:on1281835942
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