VLSI electronics microstructure science

by Einspruch, Norman G. Watts, R. K., (Roderick K.)

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Title Statements

Full title :VLSI electronics microstructure science. / edited by Norman G. Einspruch, R.K. Watts.

Edition Statements

Publication Date:©1987

Publication Statements

Publisher(s):Academic Press
Place of Publication:Orlando, Florida
Language:eng
Publication Date:©1987

The Physical Object

Description:1 online resource (374 pages) : : illustrations, graphs

Edition Identifiers

ISBN:9781483217826, 1483217825
oclc:ocn900885683
LC Classification:TK7874
Dewey Decimal:621.381/73

Front Cover; Lithography for VLSI; Copyright Page; Table of Contents; List of Contributors; Preface; Chapter 1. Optical Lithography; I. INTRODUCTION; II. OPTICAL RESISTS; III. CONTACT AND PROXIMITY PRINTING; IV. PROJECTION PRINTING; REFERENCES; Chapter 2. Lumped Parameter Model for Optical Lithography; I. INTRODUCTION; II. BACKGROUND; III. LUMPED PARAMETER MODEL; IV. COMPARISON WITH EXPERIMENTAL DATA; V. SUMMARY; APPENDIX A: IMAGE INTENSITY DISTRIBUTION; APPENDIX B: THEORY AND MATHEMATICS OF THE LUMPED PARAMETER MODEL; REFERENCES

Chapter 3. The Evolution of Electron-Beam Pattern Generators for Integrated Circuit Masks at AT&T Bell Laboratories1. INTRODUCTION; II. INTEGRATED CIRCUIT MASKS; III. A NEW SYSTEM: EBES4; IV. OVERALL SYSTEM DESCRIPTION; V. CONCLUSIONS; REFERENCES; Chapter 4. Electron Resist Process Modeling; I. INTRODUCTION; II. ELECTRON-BEAM EXPOSURE MODELING; III. ELECTRON RESIST DEVELOPMENT MODELING; IV. ELECTRON RESIST PROFILE MODELING; V. CONCLUSIONS; ACKNOWLEDGMENTS; REFERENCES; Chapter 5. Ion-Beam Lithography; I. INTRODUCTION; II. PROCESSING WITH ION BEAMS; III. ION-SUBSTRATE INTERACTIONS

IV. ION-BEAM LITHOGRAPHY SYSTEMS AND INSTRUMENTATIONV. PROBLEMS AND LIMITAT…