Schmitz, John E. J.

Integrated circuits -- Very l… (8) Tungsten (8) Vapor-plating (8) Circuits intégrés à très gran… (7) Tungstène (7) Integrated circuits -- Ultra … (5) Circuits intégrés à ultra-gra… (4) CVD-Verfahren (2) Wolfram (2) CHEMICAL VAPOUR DEPOSITION, C… (1) CHEMISCHE BESCHICHTUNGEN AUS … (1) COMPOSÉS DU TUNGSTÈNE (CHIMIE… (1) COMPUTERS -- Logic Design (1) COUCHES ÉPITAXIALES (PHYSIQUE… (1) Chemical vapour deposition (S… (1) DÉPÔT CHIMIQUE EN PHASE VAPEU… (1) Dépôt chimique en phase vapeur (1) EPITAXIALSCHICHTEN (PHYSIK VO… (1) Integrated circuits (1) METAL SILICIDES (INORGANIC CH… (1) METALLSILICIDE (ANORGANISCHE … (1) SILICIURES MÉTALLIQUES (CHIMI… (1) TECHNOLOGY & ENGINEERING -- E… (1) THIN LAYER FORMATION BY VAPOR… (1) TUNGSTEN (CHEMICAL ELEMENTS) (1) TUNGSTEN COMPOUNDS (INORGANIC… (1) TUNGSTÈNE (ÉLÉMENTS CHIMIQUES) (1) Traitements de surface (1) VLSI (1) WOLFRAM (CHEMISCHE ELEMENTE) (1) WOLFRAMVERBINDUNGEN (ANORGANI… (1)

Contributor

Schmitz, John E. J. (9)

Publisher

Noyes Publications (7) Noyes (1) Noyes Puclications (1)

Year

1992 (7) 1991 (1)

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Schmitz, John E. J.

Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications

Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications

Chemical vapor deposition of tungsten and tungsten silicides: for VLSI/ULSI applications

Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications

Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications

Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications

Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications

Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications

Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications

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