This book reviews the directed self-assembly (DSA) method technology of patterning for microelectronics. Topics include: overview of the physics and chemistry of block copolymer (BCP) materials; synthesis of new materials and new processing methods for DSA; key modelling and cha…
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymer…
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymer…
"This unique, single-source reference - the only up-to-date volume devoted exclusively to polyoxyalkylene block copolymer nonionic surfactants - focuses on copolymers made from sequential block polymerizations of ethylene oxide, propylene oxide, and 1,2-butylene oxide." "Offerin…
"This unique, single-source reference - the only up-to-date volume devoted exclusively to polyoxyalkylene block copolymer nonionic surfactants - focuses on copolymers made from sequential block polymerizations of ethylene oxide, propylene oxide, and 1,2-butylene oxide." "Offerin…
"This unique, single-source reference - the only up-to-date volume devoted exclusively to polyoxyalkylene block copolymer nonionic surfactants - focuses on copolymers made from sequential block polymerizations of ethylene oxide, propylene oxide, and 1,2-butylene oxide." "Offerin…
