Introduction to metrology applications in IC manufacturing

by Su, Bo

Type Book

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Title Statements

Full title :Introduction to metrology applications in IC manufacturing / Su Bo, Eric Solecky, and Alok Vaid.

Summary

Metrology has grown significantly, especially in semiconductor manufacturing, and such growth necessitates increased expertise. Until now, this field has never had book written from the perspective of an engineer in a modern IC manufacturing and development environment. The topics in this Tutorial Text range from metrology at its most basic level to future predictions and challenges, including measurement methods, industrial applications, fundamentals of traditional measurement system characterization and calibration, measurement system characterization and calibration, semiconductor-specific applications, optical metrology measurement techniques, charged particle measurement techniques, x-ray and in situ metrology, hybrid metrology, and mask making. Includes example spreadsheets of measurement uncertainty analysis--specifically, precision, matching, and relative accuracy.

Edition Statements

Publication Date:©2015

Publication Statements

Publisher(s):SPIE
Place of Publication:Bellingham, Washington
Language:eng
Publication Date:©2015

The Physical Object

Description:1 online resource (xvii, 167 pages) : : illustrations

Edition Identifiers

ISBN:9781628416626, 1628416629, 1628418117, 9781628418118
DOI:10.1117/3.2197207
oclc:ocn918875276
LC Classification:TK7874.58
Dewey Decimal:621.3815

Preface -- Acknowledgments -- List of acronyms -- 1. Introduction -- 2. Metrology fundamentals: measurement system characterization and calibration using traditional definitions -- 3. Fundamental metrology: redefining measurement system analysis -- 4. Metrology in the semiconductor IC industry -- 5. Metrology toolsets in IC manufacturing: optical metrology -- 6. Metrology toolsets in IC manufacturing: charged-particle metrology systems -- 7. Metrology toolsets in IC manufacturing: additional metrology systems -- 8. Limitations of metrology techniques and hybrid metrology -- 9. Metrology in mask making -- 10. Perspectives on future challenges and considerations -- Appendix -- Index.