Lithography process control

Type Book

Rate 0.0 /5

This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.

Details

Files

Reviews

Download

Title Statements

Full title :Lithography process control / Harry J. Levinson.

Summary

Edition Statements

Publication Date:©1999.

Publication Statements

Publisher(s):SPIE Optical Engineering Press
Place of Publication:Bellingham, Wash
Language:eng
Publication Date:©1999.

The Physical Object

Description:1 online resource (x, 190 pages) : : illustrations

Edition Identifiers

ISBN:9781615837366, 1615837361, 9780819478559, 0819478555
DOI:10.1117/3.322162
oclc:ocn697188897
LC Classification:TK7871.85
Dewey Decimal:621.3815/2

1. Introduction to the use of statistical process control in lithography -- The assumptions underlying statistical process control -- The properties of statistical process control -- Situations in lithography where statistical process control cannot be applied naively -- Non-normal distributions -- Process capability -- 2. Sampling -- Choosing the proper sample size -- Measurement location considerations -- Correlations -- Measurement frequency -- Systematic sources of variation -- 3. Simple and complex processes -- Definitions -- Why test wafers are useful -- How to address complex processes in lithography -- Distinguishing between layer-specific and equipment-specific effects -- 4. Linewidth control -- Cause and effect -- Independent variables -- Exposure dose -- Resist thickness -- Focus -- Bake temperatures -- Resist development -- Humidity -- DUV resists--special considerations -- Contributions from reticles -- Maximizing the process window -- 5. Overlay -- Overlay models -- Matching -- Contributions from processing and alignment mark optimization -- Addressing the problem of non-normal distributions -- Outliers -- 6. Yield -- Yield monitor strategy -- Yield models -- Paramet…

Subjects

Commande de processus Lithografie Lithographie (Halbleitertechnologie) Microlithographie Microlithographie -- Qualité Microlithography -- Quality control Semi-conducteurs -- Attaque chimique Semiconducteurs -- Qualité Semiconductors -- Etching Statistische Prozesslenkung TECHNOLOGY & ENGINEERING -- Mechanical