Title Statements
- Full title :Microlithography : science and technology / edited by Kazuaki Suzuki, Bruce W. Smith.
Edition Statements
- Publication Date:2019.
- Edition:Third edition
Publication Statements
- Publisher(s):CRC Press
- Place of Publication:Boca Raton
- Language:eng
- Publication Date:2019.
Notes
<P>Chapter 1 Lithography, Etch, and Silicon Process Technology</P><I><P>[Matthew Colburn, Derren N. Dunn, and Michael A. Guillorn]</P></I><P>Chapter 2 Optical Nanolithography</P><I><P>[Bruce W. Smith]</P></I><P>Chapter 3 Multiple Patterning Lithography</P><I><P>[Carlos Fonseca, Chris Bencher, and Bruce Smith]</P></I><P>Chapter 4 EUV Lithography</P><I><P>Stefan Wurm, Winfried Kaiser, Udo Dinger, Stephan Müllender,</P><P>Bruno La Fontaine, Obert R. Wood II, and Mark Neisser]</P></I><P>Chapter 5 Alignment and Overlay</P><I><P>[David Laidler and Gregg M. Gallatin]</P></I><P>Chapter 6 Design for Manufacturing and Design Process Technology Co-Optimization</P><I><P>[John Sturtevant and Luigi Capodieci]</P></I><P>Chapter 7 Chemistry of Photoresist Materials</P><I><P>[Takumi Uemo, Robert D. Allen, and James Thackeray]</P></I><P>Chapter 8 Photoresist and Materials Processing</P><I><P>[Bruce W. Smith]</P></I><P>Chapter 9 Optical Lithography Modeling</P><I><P>[Chris A. Mack, John J. Biafore, and Mark D. Smith]</P></I><P>Chapter 10 Maskless Lithography</P><I><P>[Kazuaki Suzuki]</P></I><P>Chapter 11 Imprint Lithography</P><I><P>[Doug Resnick and Helmut Schift]</P></I><P>Chapter 12 Metrology for Nanolithography</P><I><P>[Kazuaki Suzuki and Eran Amit]</P></I><P>Chapter 13 Directed Self-Assembly of Block Copolymers</P><I><P>[Chi-chun Liu, Kenji Yoshimoto, Juan de Pablo, and Paul Nealey]</P></I>
The Physical Object
- Description:1 online resource : : illustrations (black and white)
Edition Identifiers
- ISBN:9781351643443, 1351643444
- DOI:10.1201/9781315117171
- oclc:on1180212893
- Dewey Decimal:621.381531
Subjects
Writers
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