Ultraclean technology handbook

Ultraclean technology handbook

by Ōmi, Tadahiro

Type Book
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Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int.

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Title Statements

  • Full title :Ultraclean technology handbook / edited by Tadahiro Ohmi.

Summary

Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int.

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Edition Statements

  • Publication Date:©1993-

Publication Statements

  • Publisher(s):M. Dekker
  • Place of Publication:New York
  • Language:eng
  • Publication Date:©1993-

The Physical Object

  • Description:1 online resource (volumes <1> : : illustrations.)

Edition Identifiers

  • ISBN:9780203734827 (electronic bk), 0203734823 (electronic bk)
  • oclc:on1100118248
  • LC Classification:TS183
  • Dewey Decimal:670.42

Table of Contents

V. 1. Ultrapure water.

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Subjects

Fabrication -- Nettoyage Manufacturing processes -- Cleaning

Writers

Ōmi, Tadahiro

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