Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of…
"Plasma engineering is a rapidly expanding area of science and technology with increasing numbers of engineers using plasma processes over a wide range of applications. An essential tool for understanding this dynamic field, Plasma Physics and Engineering provides a clear, funda…
"Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes and sh…
Radio frequency (rf) atmospheric pressure glow discharges (APGDs) have received growing attention for their exciting scope of new science and their immense potential for widespread applications. While geometrically similar to conventional low-pressure discharges used in the semi…
This book is a collection of invited papers (previously published in special issues of the Journal of Adhesion Science and Technology) written by internationally recognized researchers actively working in the field of plasma surface modification. It provides a current, comprehen…
Plasma chemistry III
by Venugopalan, M., (Mundiyath), Veprek, S.
fromTopics in current chemistry