Title Statements
- Full title :Plasma processes for semiconductor fabrication / W.N.G. Hitchon.
Summary
"Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes and shows how they can be accurately modeled."--BOOK JACKET. "No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry."--Jacket.
Read More ↓Edition Statements
- Publication Date:1999.
Publication Statements
- Publisher(s):Cambridge University Press
- Place of Publication:Cambridge
- Language:eng
- Publication Date:1999.
The Physical Object
- Description:ix, 221 pages : : illustrations ; : 26 cm
Edition Identifiers
- ISBN:0521591759, 9780521591751
- oclc:ocm39508108
- LC Classification:TK7871.85
- Dewey Decimal:621.3815/2
Table of Contents
1. Introduction -- 2. Plasma Processes for Semiconductors -- 3. Plasma Electromagnetics and Circuit Models -- 4. Plasma Models -- 5. Plasma Chemistry -- 6. Transport at Long Mean Free Path -- 7. Evolution of the Trench -- 8. Physical Description of the Plasma -- 9. Going Further.
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