Computational lithography

Computational lithography

by Ma, Xu

Type Book
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A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithog…

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Title Statements

  • Full title :Computational lithography / Xu Ma and Gonzalo R. Arce.

Summary

A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting.

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Edition Statements

  • Publication Date:©2010.

Publication Statements

  • Publisher(s):Wiley
  • Place of Publication:Hoboken, N.J
  • Language:eng
  • Publication Date:©2010.

The Physical Object

  • Description:1 online resource (xv, 226 pages) : : illustrations

Edition Identifiers

  • ISBN:9780470618943, 0470618949, 9780470618936, 0470618930, 9780470596975, 047059697X, 9781118043578, 111804357X
  • DOI:10.1002/9780470618943
  • oclc:ocn689995793
  • LC Classification:TK7872.M3
  • Dewey Decimal:621.3815/31

Table of Contents

Optical Lithography Systems -- Rule-Based Resolution Enhancement Techniques -- Fundamentals of Optimization -- Computational Lithography with Coherent Illumination -- Regularization Framework -- Computational Lithography with Partially Coherent Illumination -- Other RET Optimization Techniques -- Source and Mask Optimization -- Coherent Thick-Mask Optimization -- Conclusions and New Directions of Computational Lithography -- Appendix A: Formula Derivation in Chapter 5 -- Appendix B: Manhattan Geometry -- Appendix C: Formula Derivation in Chapter 6 -- Appendix D: Formula Derivation in Chapter 7 -- Appendix E: Formula Derivation in Chapter 8 -- Appendix F: Formula Derivation in Chapter 9 -- Appendix G: Formula Derivation in Chapter 10 -- Appendix H: Software Guide.

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Subjects

Circuits intégrés -- Conception et cons… Integrated circuits -- Design and const… Microlithographie -- Mathématiques Microlithography -- Mathematics Photolithographie -- Mathématiques Photolithography -- Mathematics resolution (optical concept) Resolution (Optics) Résolution (optique) Semi-conducteurs -- Attaque chimique Semiconductors -- Etching TECHNOLOGY & ENGINEERING -- Electronics

Writers

Ma, Xu Arce, Gonzalo R.

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