Secondary ion mass spectrometry: applications for depth profiling and surface characterization

by Stevie, F. A.

Type Book

Rate 0.0 /5

Details

Files

Reviews

Download

Title Statements

Full title :Secondary ion mass spectrometry : applications for depth profiling and surface characterization / Fred A. Stevie.

Summary

Secondary ion mass spectrometry (SIMS) is a mass spectrometric technique for solid materials that can provide elemental analysis at parts per million sensitivity and lateral resolution of 50 nm. When those capabilities are combined with the ability to provide that analysis as a function of depth, SIMS has proved to be a valued technique for a wide range of applications. This book was written to explain a technique that requires an understanding of many details in order to properly obtain and interpret the data. It also will serve as a reference for those who need to provide SIMS data. The book has over 200 figures and the references allow one to trace the development of SIMS and help understand the technique.

Edition Statements

Publication Date:2016.

Publication Statements

Publisher(s):Momentum Press
Place of Publication:New York [New York] (222 East 46th Street, New York, NY 10017)
Language:eng
Publication Date:2016.

Notes

Appendix -- Index.

Title from PDF title page (viewed on December 9, 2015).

The Physical Object

Description:1 online resource (1 PDF (xx, 262 pages)) : : illustrations

Edition Identifiers

ISBN:9781606505892, 1606505890
oclc:ocn932525902
LC Classification:QD96.S43
Dewey Decimal:543.0873

1. Comparison of surface analytical techniques -- 1.1 Common elemental surface analysis techniques -- 1.2 Introduction to mass spectrometry -- 1.3 Brief history of mass spectrometry and SIMS -- 1.4 Types of mass spectrometry -- 1.5 Rationale for SIMS -- 1.6 Types of SIMS data -- References.

2. SIMS technique -- 2.1 Interaction of ions with matter -- 2.2 Sputtering process -- 2.3 Sputtering yield -- 2.4 Preferential sputtering -- 2.5 Secondary ion yield -- 2.6 Oxygen flood (oxygen leak, oxygen backfill) -- 2.7 Matrix effects -- References.

3. Analysis parameters -- 3.1 Parameters of interest for depth profiling -- 3.2 Primary beam polarity and species -- 3.3 Secondary ion polarity and species -- 3.4 Primary beam energy -- 3.5 Primary beam angle of incidence -- 3.6 Primary beam current, raster size -- 3.7 Secondary beam energy distribution, voltage offset -- 3.8 Mass interferences, mass resolution -- References.

4. Instrumentation -- 4.1 Vacuum system -- 4.2 Overall instrument -- 4.3 Ion sources -- 4.4 Primary ion column -- 4.5 Sample chamber and sample -- 4.6 Secondary ion column and mass analyzers -- 4.7 Detectors -- 4.8 Focused ion beam SIMS (FIB-SIMS) -- 4.9 Computers and dat…

Subjects

depth profiling magnetic sector mass analyzer mass spectrometry quadrupole mass analyzer Science -- Chemistry Secondary ion mass spectrometry Spectrométrie de masse des ions seconda… time-of-flight mass analyzer