Yield and reliability are two factors affecting the profitability of semiconductor manufacturing. In the manufacturing process of modern VLSI semiconductor devices, gate-oxide defects have been found as one of the major causes for the reliability problems of CMOS integrated circ…
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The focus of this work is to study the feasibility, reliability and applicability of advanced dielectrics in both Metal Oxide Semiconductor Field Effect Transistor (MOSFET) gate oxide and device level packaging for Microelectromechanical Systems (MEMS). The scaling of silicon ba…